Automatically
generates and supplies a precise chemical concentration solution
to either a wet process tank or spray tool. Used for cleaning
or etching wafers. Manufactures ammonium hydroxide, hydrochloric,
or hydrofluoric acid solutions.
Hydrofluoric,
buffered oxide, or metal etchants can be blended from either aqueous
chemicals and/or gas phase components. Precise chemistries are
metered for complete accuracy and reproducibility. The result
is an etchant ideally suited for consistent lot to lot wafer processing.
|